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News
A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography
6+ mon, 1+ week ago (53+ words) Christopher Mims / Wall Street Journal: A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography This is a Techmeme archive page. It shows how the…...