News
Force Fields Will Accelerate Atomistic Simulations By 10,000× In 2026, Unlocking New Era Of Discovery
5+ hour, 2+ min ago (610+ words) Machine learning enables a transformative leap in the modeling of atomic interactions. By Anders Blom and Igor Markov "Force fields" have long captured our imagination " the invisible shields of science-fiction lore that protect starships and superheroes from harm. But in…...
Overview of Interface Dipole Engineering: Formation Mechanisms, Control Methods, And Emerging Applications (SNU, Sejong U.)
1+ week, 5+ day ago (279+ words) Researchers at Seoul National University and Sejong University published "Interface dipole modulation for gate dielectrics in Field-Effect transistors: a review." Abstract "Interface dipole engineering has recently become a key technology in the fabrication of semiconductor FETs. This review comprehensively covers…...
DL Atomistic Semi-Empirical Pseudopotential Model For Nanomaterials (UC Berkeley, LBNL et al.)
1+ mon, 2+ week ago (152+ words) A new technical paper titled "Deep-learning atomistic semi-empirical pseudopotential model for nanomaterials" was published by researchers at UC Berkeley, Lawrence Berkeley National Laboratory, Brown University, Fritz Haber Center for Molecular Dynamics and Institute of Chemistry, and The Hebrew University of…...
AFM-Based Protocol for Characterizing the Incipient Stages of Plasticity on Hybrid Bonding-Ready Copper Pads (NIST, Intel, Colorado School of Mines)
1+ mon, 3+ week ago (300+ words) A new technical paper titled "Probing the Nanoscale Onset of Plasticity in Electroplated Copper for Hybrid Bonding Structures via Multimodal Atomic Force Microscopy" was published by researchers at the National Institute of Standards and Technology, Intel, and Colorado School of…...
Benefits And Limits Of Using ML For Materials Discovery
2+ mon, 1+ day ago (633+ words) Humans are still necessary, and no tool does everything, but the potential is significant. Machine learning tools can accelerate all stages of materials discovery, from initial screening to process development. Whether the goal is to identify new applications for known…...
Role of Elastomer Structure in Blending Strategy for Stretchable Semiconducting Thin Films (CAS, RIKEN)
2+ mon, 2+ week ago (153+ words) A new technical report titled "Polymer semiconductor blends with remarkably stable semiconducting performance under large and cyclic mechanical deformation" was published by Chinese Academy of Sciences (CAS) and RIKEN Center for Sustainable Resource Science. The paper states: "We report deformable…...
Scalable Fabrication of Nano-OLEDs Smaller Than The Defraction Limit (ETH Zurich et al.)
2+ mon, 2+ week ago (148+ words) A technical paper titled "Scalable nanopatterning of organic light-emitting diodes beyond the diffraction limit" was published by researchers at ETH Zurich, University of Alberta, Indian Institute of Science (IISc) and Huazhong University of Science and Technology. Abstract: "Miniaturization of light-emitting…...
Machine Learning Tools Accelerate Materials Discovery
2+ mon, 4+ week ago (435+ words) But only if the data is in a format and context that machines can understand. Literature searches, simulations, and practical experiments have been part of the materials science toolkit for decades, but the last few years have seen an explosion…...
Mitigating Structural Defects During The Growth Of 2D vdW Chalcogenides By MBE (Penn State Univ.)
3+ mon, 1+ day ago (261+ words) A new technical paper titled "Mitigation of Structural Defects during the Growth of 2D van der Waals Chalcogenides by Molecular Beam Epitaxy" was published by researchers at Penn State University. Abstract "The growth of wafer-scale van der Waals (vdW) thin films…...
First Stage Of Nanoscale Imaging In Positive-Tone EUV Photoresists: The Impact Of Polymer Sequence (Berkeley Lab, Columbia Hill)
4+ mon, 1+ week ago (93+ words) A new technical paper titled "Initial stage of nanoscale imaging in positive-tone extreme UV photoresists: the influence of polymer sequence" was published by researchers at Lawrence Berkeley National Laboratory and Columbia Hill Technical Consulting. Abstract "Photolithographic patterning using extreme ultraviolet…...